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newAD2 - optical characterization software

Welcome newAD2 newAD2 newAD2gui Cluster Halt / Quit Input Data Model Parameters Settings Calculate Minimum Fit Evolution Abort / Finish Restore / Import Output Grapher Messages Modeling Structural parameters Yeh matrices Mueller matrices Functions Dispersion Models Empirical Constant Cauchy formula Sellmeier formula Elementary Vacuum Drude-Lorentz (DHO) Gaussian peak Voigt peak Gauss-Lorentz peak Tauc-Lorentz Truncated Lorentzian peak Broadened polynominal function Special Sum Multiply Bruggeman formula Advanced Crystalline silicon Universal dispersion models OTF2.1 OTF2.2 Regression method Tutorials Tutorial 1 Tutorial 2 Tutorial 3 Tutorial 4 Tutorial 5 References Install History Authors

CzechNanoLab project LM2023051

References

  1. D. Franta, D. Nečas, L. Zajíčková, Application of Thomas–Reiche–Kuhn sum rule to construction of advanced dispersion models, Thin Solid Films 534 (2013) 432-441
  2. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, J. Stuchlík, D. Chvostová, Application of sum rule to the dispersion model of hydrogenated amorphous silicon, Thin Solid Films 539 (2013) 233-244
  3. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, J. Stuchlík, Advanced modeling for optical characterization of amorphous hydrogenated silicon films, Thin Solid Films 541 (2013) 12-16
  4. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, Broadening of dielectric response and sum rule conservation, Thin Solid Films 571 (2014) 496-501
  5. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, Utilization of the sum rule for construction of advanced dispersion model of crystalline silicon containing interstitial oxygen, Thin Solid Films 571 (2014) 490-495
  6. D. Franta, D. Nečas, L. Zajíčková, I. Ohlídal, Dispersion model of two-phonon absorption: application to c-Si, Optical Materials Express 4 (2014) 1641-1656
  7. D. Franta, D. Nečas, I. Ohlídal, Universal dispersion model for characterization of optical thin films over wide spectral range: Application to hafnia, Applied Optics 54 (2015) 9108-9119
  8. D. Franta, D. Nečas, I. Ohlídal, A. Giglia, Dispersion model for optical thin films applicable in wide spectral range, in: Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, SPIE 9628 (2015) 96281U-1-12
  9. D. Franta, A. Dubroka, C. Wang, A. Giglia, J. Vohánka, P. Franta, I. Ohlídal, Temperature-dependent dispersion model of float zone crystalline silicon, Applied Surface Science 421 (2017) 405-419
  10. D. Franta, P. Franta, J. Vohánka, M. Čermák, I. Ohlídal, Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region, Journal of Applied Physics 123 (2018) 185707
  11. D. Franta, J. Vohánka, J. Dvořák, P. Franta, I. Ohlídal, P. Klapetek, J. Březina, D. Škoda, Wide spectral range optical characterization of tantalum pentoxide (Ta2O5) films by the universal dispersion model, Optical Materials Express 15 (2025) 903-919